High-Density Plasma Etching System for R&D NE-550EX

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NE550EX is a multipurpose high-density plasma etching system, especially for test facilities such as universities and government agencies.

features

Equip with low-pressure, low-electron-temperature and high-density plasma source.
Supports wide range of process control from ion etching to radical etching.
Plasma density and uniformity can be controlled by optimizing magnetic field.
Simple configuration makes maintenance easy.

Item	Specification
System configuration	R&D/prototype system with Load Lock function
Substrate size	Up to 150 mm
Operating pressure (Pa)	0.07 to 6.7
Uniformity within substrate/substrate to substrate surfaces	±3% max.
Substrate temperature control	Electrostatic chuck

Company Profile

Sells and provides customer support for vacuum equipments and components

ULVAC Singapore Pte.Ltd.
India Branch

301, Tara Tycoon 12-13-97, Tarnaka Secunderabad – 500 017, India