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Dry Etching System for R&D NLD-570

NLD-570 Series

Dry etching system with ULVAC original NLD (Neutral Loop Discharge) Plasma Source.

features

  • Low process pressure, high density plasma, low electron temperature are perfect for quartz glass, Pyrex, LN, LT etc.
  • Good profile control and surface roughness.
  • Good performance of deep SiO2 etching with PR.
  • High etching rate of Quartz > 1μm/min, Pyrex > 0.8 μm/min.
  • Excellent uniformity control.
  • Cassette chamber is selectable as an option.

applications

  • Optical Devices (Wave guide, amplifier, optical switch etc), Micro lens, Photonics, μ-TAS etc.
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Sells and provides customer support for vacuum equipments and components
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contact us

ULVAC Singapore Pte.Ltd.
India Branch
301, Tara Tycoon 12-13-97, Tarnaka Secunderabad – 500 017, India
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