Load-lock type Plasma-CVD System CC-200/400 Series

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CC-200/400 Series

CC-200/400 is a compact and easy-to-use system for R&D use and production.

features

High-density plasma process on 27.12MHz
Supports the deposition of SiH₄ (SiO₂, SiNx, SiON, a-Si ) and TEOS (SiO₂).
Supports the chamber cleaning by CF₄+O₂ plasma.
Supports the heater for low-temperature deposition of organic EL.
Supports various substrate sizes.
Vacuum box-enabled indirect sequential processing within C-series (Sputter: CS-200, Evaporation: CV-200).

applications

Power devices
Compound-related devices of LED, LD and highspeed devices
Organic EL system for R&D use
Solar battery system for R&D use
MEMS

Company Profile

Sells and provides customer support for vacuum equipments and components

contact us

ULVAC Singapore Pte.Ltd.
India Branch

301, Tara Tycoon 12-13-97, Tarnaka Secunderabad – 500 017, India

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