The ULGLAZE Series are Expanding Thermal Plasma CVD (ETP-CVD) systems for deposition of scratch and abrasion resistant coatings onto polycarbonate using monomer and O2 reagents.
| CMD- 450BHT | CMD- 650HT | CMD- 950 | ||
| Substrate size (mm) | 400X 500 Xt0.7 | 600 X 720 Xt0.7 | 730X920 Xt0.7-0.5 | |
| Chamber configuration | 1) Loading/ unloading chambers | 2 | 2 | 2 |
| 2) Heating chambers | 1 | 1 | 1 | |
| 3) Reaction chambers | 4 (3 if annealing chamber is mounted) | 4 (3 if annealing chamber is mounted) | 5 (4 if annealing chamber is mounted) | |
| 4) Transfer chambers | 1 (7-sided) | 1 (7-sided) | 1 (8-sided) | |
| 5) Evacuation system Loading/ unloading chamber Reaction chambers | Rotary + mechanical booster Dry + mechanical booster | Rotary + mechanical booster Dry + mechanical booster | Rotary + mechanical booster Dry + mechanical booster | |
| 6) Substrate transfer unit | Option | Option | Option | |
| Productivity | 65 seconds/ substrate (for single- layer 300 nm SiN film under standard ULVAC conditions) | 65 seconds/ substrate (for single- layer 300 nm SiN film under standard ULVAC conditions) | 75 seconds/ substrate (for single- layer 300 nm SiN film under standard ULVAC conditions) | |